Beilstein J. Nanotechnol.2012,3, 884–892, doi:10.3762/bjnano.3.98
materials with relatively short characteristic relaxation lengths.
Keywords: magneticpointcontactarrays; spin laser; sub-10 nm colloidal lithography; Introduction
Colloidal lithography [1] is a method to reproduce patterns in a variety of natural systems and is used more and more as an efficient
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Figure 1:
Tapping-mode atomic force microscopy images of a typical monolayer, with the particle diameter (and...